Photosensitive Polyimide-silicone Copolymer based on Reaction Development Patterning (RDP)-Reference-Cited by-同舟云学术

Photosensitive Polyimide-silicone Copolymer based on Reaction Development Patterning (RDP)

Published:2016 Issue:2 Volume:29 Page:273-276
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Oyama Toshiyuki¹,Kasahara Aya¹,Yasuda Megumi¹,Takahashi Akio¹

Affiliation:

1. Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/29/2/29_273/_pdf

Reference22 articles.

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2. 2. Micro- and Nanopatterning Polymers; Ito, H.; ACS Symposium Series 706, American Chemical Society: Washington DC, 1998.

3. 3. K. Fukukawa, M. Ueda, Polym. J., 40 (2008) 281.

4. 4. M. Tomikawa, S. Yoshida, N. Okamoto, Polym. J., 41 (2009) 604.

5. 5. Y. Tong, T. Liu, S. Veeramani, T.-S. Chung, Ind. Eng. Chem. Res., 41 (2002) 4266.

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