The Effect of Photo-initiator on the Contrast Curve of Negative-work Photo-resist-Reference-Cited by-同舟云学术

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The Effect of Photo-initiator on the Contrast Curve of Negative-work Photo-resist

Published:2011 Issue:6 Volume:24 Page:643-646
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Huang Ta-Yu,Cheng Wen-Tung

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/24/6/24_6_643/_pdf

Reference14 articles.

1. 1. Pappas SP, editor. UV curing: science and technology marketing corporation. Stanford, CT, USA, 1978.

2. 2. Roffey CG. Photopolymerisation of surface coating. New York: Wiley, 1982.

3. 3. H. Moritz et al. US Patent No. 4104070 (1978).

4. 4. W. L. Kausch, C. Grove. US Patent No.4476215 (1984).

5. 5. S. Iwasa et al. US Patent No. 6074801 (2000).

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