Spin-on silicon-nitride Films for Photo-lithography by RT Cure of Polysilazane
Author:
Affiliation:
1. PHPS R&D Division, STC, AZ Electronic Materials Japan KK
2. Global Applications, R&D Division, AZ Electronic Materials USA Corp
3. Department of Applied Chemistry, Graduate School of Engineering, Saitama Institute of Technology,
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/23/2/23_2_225/_pdf
Reference44 articles.
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2. (b) P. M. Mendes, S. Jacke, K. Critchley, J. Plaza, Y. Chen, K. Nikitin, R. E. Palmer, J. A. Preece, S. D. Evans, D. Fitzmaurice, Langmuir 2004, 20, 3766.
3. (c) M. T. Russell, L. S. C. Pingree, M. C. Hersam, T. J. Marks, Langmuir 2006, 22, 6712.
4. (d) Y. Wada, M. Katsumura, Y. Kojima, H. Kitahara, T. Iida, Jpn. J. Appl. Phys. 2001, 40, 1653.
5. (e) S. Hosaka,; H. Sano, K. Itoh, H. Sone, Microelectron. Eng. 2006, 83 792.
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