Integration of Directed Self-Assembly with 193 nm Lithography-Reference-Cited by-同舟云学术

Integration of Directed Self-Assembly with 193 nm Lithography

Published:2010 Issue:1 Volume:23 Page:11-18
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Sanders Daniel P.,Cheng Joy,Rettner Charles T.,Hinsberg William D.,Kim Ho-Cheol,Trung Hoa,Fritz Alexander,Harrer Steven,Holmes Steven,Colburn Matthew

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/23/1/23_1_11/_pdf

Reference40 articles.

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4. (b) A. Carlson and T.-J. K. Liu, J. Micro/Nanolith. MEMS MOEMS, 8 (2009) 011009-1.

5. 3. M. LaPedus, EE Times, 30 January, 2010. http://www.eetimes.com/showArticle.jhtml?articleID=222600535.

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