Negative EUV Resist Based on Thiol-Ene System-Reference-Cited by-同舟云学术

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Negative EUV Resist Based on Thiol-Ene System

Published:2010 Issue:5 Volume:23 Page:687-691
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Shirai Masamitsu,Maki Koichi,Okamura Haruyuki,Kaneyama Koji,Itani Toshiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/23/5/23_5_687/_pdf

Reference14 articles.

1. 1. R.A. Lawson, L. M. Tolbert, C. L. Henderson, Proc. SPIE, 7273 (2009) 72733C.

2. 2. R.A. Lawson, L. M. Tolbert, T. R. Younkin, C. L. Henderson, Proc. SPIE, 7273 (2009) 72733E.

3. 3. A. D. Silva, N. Felix, D. Forman, J. Sha, C. K. Ober, Proc. SPIE, 6923 (2008) 69230O.

4. 4. R. A. Lawson, C. T. Lee, W. Yueh, L. Tolbert, C. L. Henderson, Proc. SPIE, 6923 (2008) 69230K.

5. 5. M. Wang, C. T. Lee, C. L. Henderson, W. Yueh, J. M. Roberts, K. E. Gonsalves, Proc. SPIE, 6923 (2008) 692312.

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