1. Progress in EUV Resist Development
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3. Synthesis, Characterization and Lithography Performance of Novel Anionic Photoacid Generator (PAG) Bound Polymers
4. 4. Hideaki Tsubaki, Tooru Tsuchihashi, Katsuhiro Yamashita, and Tomotaka Tsuchimura, "Resist materials design to improve sensitivity in EUV lithography," Proc. SPIE, 7273, 72733P-1 (2009).
5. 5. E. Steve Putna, Todd R. Younkin, Manish Chandhok, and Kent Frasure, "EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity and LWR tradeoffs," Proc. SPIE, 7273, 72731L-1 (2009).