Resonant Soft X-ray Reflectivity for the Chemical Analysis in Thickness Direction of EUV Resist
Author:
Affiliation:
1. Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/32/2/32_333/_pdf
Reference18 articles.
1. 1. E. S Jung, "4th Industrial Revolution and Foundry: Challenges and Opportunities," IEDM2018 Plenary talk.
2. 2. International Roadmap for Devices and Systems (IRDSTM), https://irds.ieee.org/
3. 3. M. Nakagawa, Kobunshi, 68 (2019) 24 (in Japanese).
4. 4. M. Nakagawa, T. Uehara, Y. Ozaki, T. Nakamura, and S. Ito, J. Vac. Sci. Technol. B, 36 (2018) 06JF02.
5. 5. D. Simone, Y. Vester, and G. Vandenberghe, J. Photopolym. Sci. Teechnol., 31 (2018) 651
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1. Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist;Journal of Photopolymer Science and Technology;2022-12-16
2. Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure;Journal of Photopolymer Science and Technology;2022-12-16
3. The measurement of the refractive index n and k value of the EUV resist which used EUV reflectivity measurement method;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01
4. High-NA EUV lithography: current status and outlook for the future;Japanese Journal of Applied Physics;2022-04-20
5. Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility;Journal of Photopolymer Science and Technology;2021-06-11
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