Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility
Author:
Affiliation:
1. Center for EUVL, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_49/_pdf
Reference11 articles.
1. 1. International Symposium on Extreme Ultraviolet Lithography, (2021) Closing remarks.
2. 2. Web site of NewSUBARU Synchrotoron facility, http://www.lasti.u-hyogo.ac.jp/NS/
3. 3. M. Nakagawa, Jpn. J. Polym.Sci. Tech. 68 (2019) 24 (in Japanese)
4. 4. M. Nakagawa, T. Uehara, Y. Ozaki, T. Nakamura, and S. Ito, J. Vac. Sci. Technol. B 36 (2018) 06JF02.
5. 5. T. Ishiguro, J. Tanaka, T. Harada, and T. Watanabe, J. Photopolym. Sci. Technol. 32 (2019) 333.
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