High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing-Reference-Cited by-同舟云学术

High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing

Published:2019-06-24 Issue:1 Volume:32 Page:77-86
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Mizoguchi Hakaru¹,Nakarai Hiroaki¹,Abe Tamotsu¹,Tanaka Hiroshi¹,Watanabe Yukio¹,Hori Tsukasa¹,Kodama Takeshi¹,Shiraishi Yutaka¹,Yanagida Tatsuya¹,Soumagne Georg¹,Yamada Tsuyoshi¹,Saitou Takashi¹

Affiliation:

1. Gigaphoton Inc. Hiratsuka facility

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/32/1/32_77/_pdf

Reference24 articles.

1. 1. N. Harned, M. Goethals, R. Groeneveld, P. Kuerz, M. Lowisch, H. Meijer, H. Meiling, K. Ronse, J. Ryan, M. Tittnich, H.-J. Voorma, J. Zimmerman, U. Mickan, and S. Lok, Proc. SPIE, 6517 (2007) 651706.

2. 2. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada, Y. Ohkubo, and H. Kawai, Proc. SPIE, 6921 (2008) 69210M.

3. 3. C. Wagner, N. Harned, P. Kuerz, M. Lowisch, H. Meiling, D. Ockwell, R. Peeters, K. van Ingen-Schenau, E. van Setten, J. Stoeldraijer, and B. Thuering, Proc. SPIE, 7636 (2010) 76361H.

4. 4. C. Wagner, J. Bacelar, N. Harned, E. Loopstra, S. Hendriks, I. de Jong, P. Kuerz, L. Levasier, M. van de Kerkhof, M. Lowisch, H. Meiling, D. Ockwell, R. Peeters, E. van Setten, J. Stoeldraijer, S. Young, J. Zimmerman, and R. Kool, Proc. SPIE, 7969 (2011) 79691F.

5. 5. R. Peeters, S. Lok, E. van Alphen, N. Harned, P. Kuerz, M. Lowisch, H. Meijer, D. Ockwell, E. van Setten, G. Schiffelers, J.-W. van der Horst, J. Stoeldraijer, R. Kazinczi, R. Droste, H. Meiling, and R. Kool, Proc. SPIE, 8679 (2013) 86791F.

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The development of laser-produced plasma EUV light source;Chip;2022-09

2. Design of an efficient illuminator for partially coherent sources in the extreme ultraviolet;Applied Optics;2022-04-04

3. Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning;ACS Applied Electronic Materials;2021-04-22