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A Comparison of Removal Phenomena in Photoresist Materials Using Laser Irradiation

  • Published:2019-06-24 Issue:4 Volume:32 Page:603-607
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Kamimura Tomosumi1,Nishioka Naoki1,Umeda Yuji1,Shima Daichi1,Funamoto Yusuke1,Harada Yoshiyuki2,Yoshimura Masashi3,Nakamura Ryosuke4,Horibe Hideo5

Affiliation:

1. Department of Electronics and Information Systems Engineering, Osaka Institute of Technology

2. Nanomaterials and Microdevices Research Center, Osaka Institute of Technology

3. ILE, Osaka University

4. Science & Technology Entrepreneurship Laboratory, Osaka University

5. Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment;Journal of Photopolymer Science and Technology;2023-06-15
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