Alternative Developer Solutions and Processes for EUV and ArFi Lithography-Reference-Cited by-同舟云学术

Alternative Developer Solutions and Processes for EUV and ArFi Lithography

Published:2019-06-24 Issue:2 Volume:32 Page:321-326
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Harumoto Masahiko¹,Santillan Julius Joseph²,Nakayama Chisayo¹,Tanaka Yuji¹,Motono Tomohiro¹,Asai Masaya¹,Itani Toshiro²

Affiliation:

1. SCREEN Semiconductor Solutions Co., Ltd.

2. The Institute of Scientific and Industrial Research, Osaka University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/32/2/32_321/_pdf

Reference21 articles.

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2. 2. E. van Setten, G. Bottiglieri, J. McNamara, J. van Schoot, K. Troost, J. Zekry, T. Fliervoet, S. Hsu, J. Zimmermann, M. Roesch, B. Bilski, and P. Graeupner, Proc. SPIE, 10957 (2019) 1095709.

3. 3. O. Wood II, J. Photopolym. Sci. Technol., 30 (2017) 599.

4. 4. Z. Tasdemir, X. Wang, I. Mochi, L. van Lent-Protasova, M. Meeuwissen, R. Custers, G. Rispens, R. Hoefnagels, and Y. Ekinci, Proc. SPIE, 10809 (2018) 108090L.

5. 5. D. De Simone, Y. Vesters, P. Venelderen, X. Ran, I. Pollentier, and G. Vandenberghe, Proc. SPIE, 10809 (2018) 108090U.

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