Relationship between Oxygen Additive Amount and Photoresist Removal Rate Using H Radicals Generated on an Iridium Hot-Wire Catalyst-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Relationship between Oxygen Additive Amount and Photoresist Removal Rate Using H Radicals Generated on an Iridium Hot-Wire Catalyst

Published:2019-06-24 Issue:4 Volume:32 Page:609-614
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamamoto Masashi¹,Shiroi Tomohiro¹,Shikama Tomokazu¹,Nagaoka Shiro²,Umemoto Hironobu³⁴,Horibe Hideo⁴

Affiliation:

1. Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College

2. Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College

3. Graduate School of Integrated Science and Technology, Shizuoka University

4. Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/32/4/32_609/_pdf

Reference23 articles.

1. 1. H. Morinaga, T. Futatsuki, T. Ohmi, E. Fuchita, M. Oda, and C. Hayashi, J. Electrochem. Soc., 142 (1995) 966.

2. 2. K. Hirose, H. Shimada, S. Shimomura, M. Onodera, and T. Ohmi, J. Electrochem. Soc., 141 (1994) 192.

3. 3. M. A. Worsley, S. F. Bent, N. C. M. Fuller, and T. Dalton, J. Appl. Phys., 100 (2006) 083301.

4. 4. K. Shinagawa, H. Shindo, K. Kusaba, T. Koromogawa, J. Yamamoto, and M. Furukawa, Jpn. J. Appl. Phys., 40 (2001) 5856.

5. 5. S. Fujimura and H. Yano, J. Electrochem. Soc., 135 (1988) 1195.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H<sub>2</sub>/O<sub>2</sub> Mixture Activated by Hot Tungsten Wire;Journal of Photopolymer Science and Technology;2023-06-15

2. Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk;Journal of Photopolymer Science and Technology;2022-12-16

3. Evaluation of Decomposition Property of Photoresist by Oxygen Radicals Using Helium-Oxygen Mixtures;Journal of Photopolymer Science and Technology;2020-07-01

4. Effects of Nitrogen Dilution on the Photoresist Removal Rate by Hydrogen Radicals;Journal of Photopolymer Science and Technology;2020-07-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3