Improvement of Gas Permeability of Gas Permeable Mold with Lattice Structure for Reduction of Transfer Failure in Photoimprint Lithography-Reference-Cited by-同舟云学术

Improvement of Gas Permeability of Gas Permeable Mold with Lattice Structure for Reduction of Transfer Failure in Photoimprint Lithography

Published:2019-06-24 Issue:4 Volume:32 Page:627-632
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Sugino Naoto¹²,Kurematsu Kazuho¹,Mizui Kento¹,Hanabata Makoto¹,Takei Satoshi¹

Affiliation:

1. Department of Mechanical Systems Engineering, Toyama Prefectural University

2. Technology Development Division, SANKO GOSEI Ltd.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/32/4/32_627/_pdf

Reference14 articles.

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3. 3. T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, J. Vac. Sci. Technol. B, 18 (2000) 3572.

4. 4. S. H. Ahn and J. S. Guo, ACS Nano, 3 (2009) 2304.

5. 5. S. Y. Chou, P. R. Krauss and P. J. Renstrom, J. Vac. Sci. Technol. B, 14 (1996) 4159.

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