Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist-Reference-Cited by-同舟云学术

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Development of Dissolution Inhibitor in Chemically Amplified Positive Tone Thick Film Resist

Published:2018-06-25 Issue:3 Volume:31 Page:399-402
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Sotokawa Yusuke¹,Nishiyama Takashi¹,Sato Eriko¹,Horibe Hideo¹

Affiliation:

1. Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/31/3/31_399/_pdf

Reference20 articles.

1. 1. R. Haruta, J. Inst. Electri. Electron. Eng., 10 (2007) 353.

2. 2. G. Mago, J. Surf. Finish. Soc. Jpn., 65 (2014) 349.

3. 3. K. Sakai, K. Nakahira, M. Umeda, and K. Kitami, J. JSPE, 83 (2017) 125.

4. 4. K. Takagi, J. Surf. Finish. Soc. Jpn., 61 (2010) 350.

5. 5. K. Toriyama, K. Okamoto, S. Kohara, and Y. Orii. Trans. JIEP, 14 (2011) 372.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides;Journal of Photopolymer Science and Technology;2024-06-25

2. Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility;Journal of Photopolymer Science and Technology;2021-06-11

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