Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film-Reference-Cited by-同舟云学术

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Use of Interferometric Lithography to Characterize the Spatial Resolution of a Photoresist Film

Published:2003 Issue:3 Volume:16 Page:373-379
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Hoffnagle John A.,Hinsberg William D.,Houle Frances A.,Sanchez Martha I.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/16/3/16_3_373/_pdf

Reference22 articles.

1. 1. International Technical Roadmap for Semiconductors, SEMATECH, Inc., Austin, Texas, 2001.

2. Limits of lithography

3. 3. W. Hinsberg, F. Houle, M. Sanchez, J. Hoffnagle, G. Wallraff, D. Medeiros, G. Gallatin, and J. Cobb, Proc. SPIE 5039 (2003) in press.

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1. Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-11

2. Laser nanofabrication in photoresists and azopolymers;Laser & Photonics Reviews;2013-03-12

3. Nano-structuring of solid surface by extreme ultraviolet Ar8+ laser;Laser and Particle Beams;2011-12-30

4. 3D THz metamaterials from micro/nanomanufacturing;Laser & Photonics Reviews;2011-09-19

5. Extreme ultraviolet lithography with table top lasers;Progress in Quantum Electronics;2010-07

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