Introducing 157 nm Full Field Lithography-Reference-Cited by-同舟云学术

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Introducing 157 nm Full Field Lithography

Published:2003 Issue:4 Volume:16 Page:549-556
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Goethals A.M.¹,De Bisschop P.¹,Hermans J.¹,Jonckheere R.¹,Van Roey F.¹,Van den Heuvel D.¹,Eliat A.¹,Ronse K.¹

Affiliation:

1. IMEC

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/16/4/16_4_549/_pdf

Reference26 articles.

1. 1. M. Rothschild et al, J. Photopolym. Sci. Technol., 13, number 3, (2000), p.369.

2. 2. K. Dean et al, J. Photopolym. Sci. Technol., 14, number 4, (2001), p.573.

3. 3. J.H. Burnett, Z.H. Levine and E.L. Shirley, Physical Review B, vol.64, 241102. (1998), 179.

4. 4. Y. Ikuta et al”, 3^rd International Symposium on 157 nm lithography, 3-6 September 2002, Antwerp, unpublished.

5. 5. W. Conley et al., 3^rd International Symposium on 157 nm lithography, 3-6 September 2002, Antwerp, unpublished.

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