The Measurement of the Refractive Index <i>n</i> and <i>k</i> Value of the EUV Resist by EUV Reflectivity Measurement Method-Reference-Cited by-同舟云学术

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The Measurement of the Refractive Index n and k Value of the EUV Resist by EUV Reflectivity Measurement Method

Published:2021-06-11 Issue:1 Volume:34 Page:105-110
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Ohta Yosuke¹,Sekiguchi Atsushi¹,Harada Tetsuo²,Watanabe Takeo²

Affiliation:

1. Litho Tech Japan Co., Ltd.

2. Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_105/_pdf

Reference15 articles.

1. 1. A. Sekiguchi and Y. Sensu, Proc. SPIE, 8682 (2013) 55.

2. 2. A. Sekiguchi, Y. Matsumoto, H. Konishi, K. Moriyasu, and Y. Morimoto, Proc. SPIE, 7972 (2011).

3. 3. A. Sekiguchi, Y. Matsumoto, and J. J. Biafor, Proc. SPIE, 8682 (2013).

4. 4. A. Sekiguchi and Y. Matsumoto, Proc. SPIE, 9051 (2014).

5. 5. A. Sekiguchi, T. Watanabe, and H. Kinoshita, J. Photopolym. Sci. Technol., 27 (2014) 623.

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1. Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure;Journal of Photopolymer Science and Technology;2024-05-31

2. Comparison of photoresist sensitivity between KrF, EB, and EUV exposure;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

3. Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure;Journal of Photopolymer Science and Technology;2022-12-16

4. Study of the Dependence of the Refractive Index of Exposed Positive Photoresists on the Conditions of Preliminary Heat Treatment;Optoelectronics, Instrumentation and Data Processing;2022-12

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