Author:
Choi Namuk,Kim Jae Hyun,Kim Young-Ho,Kim Tae-Sung
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference11 articles.
1. 1. A. Jouve, J. Simon, J. Foucher, and T. David, Proc. SPIE, 5753 (2005), 720.
2. EUV Resist Screening: Current Performance and Issues
3. 3. J. Tallal, K. Berton, M. Gordon, and D. Peyrade, J. Vac. Sci. Technol. B, 23 (2005), 2914.
4. Characterization and Lithographic Performance of Silsesquioxane 193 nm Bilayer Resists
5. 5. Phatak, Girish J., and Ogawa, Proc. SPIE , 3676 (1999), 333.
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