Author:
Houlihan Francis M.,Rentkiewicz David,Lin Guanyang,Rahman Dalil,Mackenzie Dougls,Timko Allen,Kudo Takanori,Anyadiegwu Clement,Thiyqarqjan Muthiah,Chiu Simon,Romano Andrew,Dammel Rqlph R.,Padmanaban Murirathna
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference28 articles.
1. 1. J-Y. Lee, J-H. Shin, H-W Kim, S-G. Woo, H-K. Cho, W-S. Han, and J-T. Moon, Proc. SPIE 5376 (2004) 426.
2. 2. Yamaguchi, K. Ichinose, S. Shimamoto, H. Fukuda, R. Tsuchiya, K. Ohnishi, H. Kawada, and T. Iizumi., Proc. SPIE 5375 (2004) 468.
3. 3. K. Shibata, N. Izumi, and K. Tsujita, Proc. SPIE 5375 (2004) 865.
4. An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling
5. Direct measurement of x-ray mask sidewall roughness and its contribution to the overall sidewall roughness of chemically amplified resist features
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