Progress in EUV Photoresists for High-Resolution Patterning-Reference-Cited by-同舟云学术

Progress in EUV Photoresists for High-Resolution Patterning

Published:2022-12-16 Issue:1 Volume:35 Page:101-104
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Otsubo Yusuke¹,Sakai Kazunori¹,Kasahara Kazuki¹,Xu Hong¹,Giannelis Emmanuel P.¹,Ober Christopher K.¹

Affiliation:

1. Materials Science and Engineering, Cornell University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/35/1/35_101/_pdf

Reference20 articles.

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2. 2. M. Trikeriotis, W. J. Bae, E. Schwartz, M. Krysak, N. Lafferty, P. Xie, B. Smith, P. A. Zimmerman, C. K. Ober, and E. P. Giannelis, Proc. SPIE, 7639 (2010) 76390E.

3. 3. M. Trikeriotis, M. Krysak, Y. S. Chung, C. Ouyang, B. Cardineau, R. Brainard, C. K. Ober, E. P. Giannelis, and K. Cho, J. Photopolym. Sci. Technol., 25 (2012) 5836.

4. 4. P. Naulleau and G. Gallatin, J. Micro/Nanolith. MEMS MOEMS, 17 (2018) 041015.

5. 5. H. Xu, K. Sakai, K. Kasahara, V. Kosma, K. Yang, H. C. Herbol, J. Odent, P. Clancy, E. P. Giannelis, and C. K. Ober, Chem. Mater., 30 (2018) 4124.

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