Novel Resist Materials Using Acid Amplifiers. Part II.-Reference-Cited by-同舟云学术

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Novel Resist Materials Using Acid Amplifiers. Part II.

Published:1997 Issue:2 Volume:10 Page:315-316
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Noguchi Soh,Arimitsu Koji,Ichimura Kunihiro,Kudo Kazuaki,Ohfuji Takeshi,Sasago Masaru

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/10/2/10_2_315/_pdf

Cited by 17 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design strategy of extreme ultraviolet resists;Japanese Journal of Applied Physics;2024-05-01

2. Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials;Journal of Photopolymer Science and Technology;2020-07-01

3. Molecular Design and Function of Photo-acid Generators Utilized for Advanced Industries;Journal of Synthetic Organic Chemistry, Japan;2020-01-01

4. Sensitivity enhancement of chemically amplified EUV resists by adding acid-generating promoters;Japanese Journal of Applied Physics;2017-05-12

5. Novel Acid Amplifier Generating Disulfonimide as Superacid;Journal of Photopolymer Science and Technology;2017

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