Affiliation:
1. Department of Materials Science and Engineering, Cornell University
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference11 articles.
1. 1. K. Kemp, S. Wurm, EUV lithography. C. R. Physique, 7(8) (2006) 875-886.
2. 2. H. Kawata, J. M. Carter, A. Yen, H. I. Smith, Optical projection lithography using lenses with numerical apertures greater than unity. Microelectr. Eng., 9(1) (1989) 31-36.
3. 3. D. Flagello, A. Rosenbluth, C. Progler, J. Armitage, Understanding high numerical aperture optical lithography. Microelectr. Eng., 17(1-4) (1992) 105-108.
4. 4. S. Chakrabarty, C. Ouyang, M. Krysak, M. Trikeriotis, K. Cho, E. P. Giannelis, C. K. Ober, In Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning, Proc. SPIE, 8679 (2013) 867906-867906-8.
5. 5. S. Chakrabarty,C. Sarma, L. Li, E. Giannelis, C. K. Ober, In Increasing sensitivity of oxide nanoparticle photoresists, Proc. SPIE, 9048 (2014) 90481C-90481C-5.
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