Multiphysics Simulation of Nanopatterning in Electron Beam Lithography-Reference-Cited by-同舟云学术

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Multiphysics Simulation of Nanopatterning in Electron Beam Lithography

Published:2016 Issue:5 Volume:29 Page:725-730
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yasuda Masaaki¹,Tada Kazuhiro²,Kotera Masatoshi³

Affiliation:

1. Department of Physics and Electronics, Osaka Prefecture University

2. Department of Electrical and Control Systems Engineering,National Institute of Technology, Toyama College

3. Department of Electronics, Information and Communication Engineering,Osaka Institute of Technology

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/29/5/29_725/_pdf

Reference18 articles.

1. 1. K. Murata, E. Nomura, K. Nagami, T. Kato, and H. Nakata, Jpn. J. Appl. Phys., 17 (1978) 1851.

2. 2. E. Nomura, K. Murata, and K. Nagami, Jpn. J. Appl. Phys., 18 (1979) 1353.

3. 3. A. R. Neureuther, D.F. Kyser, and C.H. Ting, IEEE Trans. Electron Devices, ED-26 (1979) 686.

4. 4. W. G. Oldham, S. N. Nandgaonkar, A. R. Neureuther, and M. O'Toole, IEEE Trans. Electron Devices, ED-26 (1979) 717.

5. 5. K. Murata, D. F. Kyser, and C. H. Ting, J. Appl. Phys., 52 (1981) 4396.

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2. Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials;Polymers;2021-01-30

3. Multiscale Simulation of the Development Process in Electron Beam Lithography;Journal of Photopolymer Science and Technology;2017

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