Defectivity Study for Directed Self-Assembly (DSA) Contact Hole Shrink
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Published:2016
Issue:6
Volume:29
Page:793-796
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ISSN:0914-9244
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Container-title:Journal of Photopolymer Science and Technology
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language:en
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Short-container-title:J. Photopol. Sci. Technol.
Author:
Ko Tsung-Han1, Lo Kuan-Hsin1, Wu Chieh-Han1, Chang Ching-Yu1, Lee Chung-Ju1, Lin John1
Affiliation:
1. Taiwan Semiconductor Manufacturing Company, Ltd.
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference6 articles.
1. 1. B. Rathsack, M. Somervell, J. Hooge, M. Muramatsu, K. Tanouchi, T. Kitano, E. Nishimura, K. Yatsuda, S. Nagahara, I. Hiroyuki, K. Akai, and T. Hayakawa, Proc. SPIE, 8323 (2012) 83230B-1. 2. 2. S. Minegishi, Y. Anno, Y. Namie, and T. Nagai, J. Photopolym. Sci. Technol., 25 (2012) 21. 3. 3. P. R. Delgadillo, M. Suri, S. Durant, A, Cross, V. R. Nagaswami, D. Van Den Heuvel, R. Gronheid, and P. Nealey, J. Micro/Nanolith. MEMS MOEMS., 12 (2013) 033112. 4. 4. C. Bencher, H. Yi, J. Zhou, M. Cai, J. Smith, L. Miao, O. Montal, S. Blitshtein, A. Lavi, K. Dotan, H. Dai, J. Y. Cheng, D. P. Sanders, M. Tjio, S. Holmes, Proc. SPIE, 8323 (2012) 83230N. 5. 5. The International Technology Roadmap for Semiconductors, 2011 Edition, Lithography, (2011).
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