Novel High Sensitivity EUV Photoresist for Sub-7 nm Node-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Novel High Sensitivity EUV Photoresist for Sub-7 nm Node

Published:2016 Issue:3 Volume:29 Page:475-478
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Nagai Tomoki¹,Nakagawa Hisashi¹,Naruoka Takehiko¹,Dei Satoshi²,Tagawa Seiichi³,Oshima Akihiro³,Nagahara Seiji⁴,Shiraishi Gosuke⁵,Yoshihara Kosuke⁵,Terashita Yuichi⁵,Minekawa Yukie⁵,Buitrago Elizabeth⁶,Ekinci Yasin⁶,Yildirim Oktay⁷,Meeuwissen Marieke⁷,Hoefnagels Rik⁷,Rispens Gijsbert⁷,Verspaget Coen⁷,Maas Raymond⁷

Affiliation:

1. JSR Corporation

2. JSR Micro N.V.

3. Osaka University

4. Tokyo Electron Ltd.

5. Tokyo Electron Kyushu Ltd.

6. Paul Scherrer Institute

7. ASML Netherlands B.V.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/29/3/29_475/_pdf

Reference11 articles.

1. 1. U.S. Patent 2569347, 2502488.

2. 2. U.S. Patent 3138743.

3. 3. J. M. J. Frechet, H. Ito, C. G. Willson, Proceedings Microcircuit Engineering, 82 (1982) 260.

4. 4. C. G. Willson, H. Ito, J. M. J. Frechet, Microcircuit Engineering, 82 (1982) 261.

5. 5. C. G. Willson, H. Ito, J. M. J. Frechet, F. Houlihan, International Union of Pure and Applied Chemistry 28 (1982) 448.

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography;Journal of Photopolymer Science and Technology;2024-06-25

2. Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists;Polymers;2024-03-15

3. Extreme ultraviolet lithography reaches 5 nm resolution;Nanoscale;2024

4. Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography;Applied Optics;2023-01-23

5. Recent advances in polymer/metal/metal oxide hybrid nanostructures for catalytic applications: a review;Journal of Environmental Chemical Engineering;2020-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3