Low‐Background Instrumental Neutron Activation Analysis of Silicon Semiconductor Materials-Reference-Cited by-同舟云学术

Low‐Background Instrumental Neutron Activation Analysis of Silicon Semiconductor Materials

Published:1996-01-01 Issue:1 Volume:143 Page:339-346
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Smith A. R.¹,McDonald R. J.¹,Manini H.¹,Hurley D. L.¹,Norman E. B.¹,Vella M. C.²,Odom R. W.¹²³

Affiliation:

1. Nuclear Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720

2. Accelerator and Fusion Research Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720

3. Charles Evans and Associates, Redwood City, California 94063

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1836433/pdf

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