1. C. Hu, Tech. Dig. Int. Electron Devices Meet., p. 319 (1996).
2. The National Technology Roadmap for Semiconductors, p. 74, Semiconductor Industry Association, San Jose, CA (1997).
3. Electrical breakdown in thin gate and tunneling oxides
4. T. Ohmi, Abstract 302, p. 495, The Electrochemical Society Extended Abstracts, Vol. 93-2, New Orleans, LA, Oct 10-15, 1993.
5. C. Y. Chang and S. M. Sze,ULSI Technology, p. 61, McGraw-Hill, New York (1996).