1. Low k, Porous Methyl Silsesquioxane and Spin-On-Glass
2. T. A. Dies, E. Moyer, K. Chung, M. Spaulding, Y. Liu, C. Saha, W. Chan, and J. Bremmer, inProceedings of the Semicon Korea Technical Symposium 2000, Semicon Korea Symposium Executive Committee p. 287, Feb 15, 2000.
3. N. H. Hendricks, inProceedings of the Dielectrics for VLSI/ULSI Multilevel Interconnection Conference (DUMIC) 2000, DUMIC Conference Executive Committee, p. 17, Feb 27-29, 2000.
4. Q. Han, W. Chen, C. Waldfried, O. Escorcia, Nick M. Sbrockey, T. J. Bridgewater, E. S. Moyer, and I. Berry, inProceedings of the IEEE 2001 International Interconnect Technology Conference (IITC)IITC Conference Executive Committee, p. 171, June 4-6, 2001.
5. M. J. Lobota, J. A. Seiffery, C. M. Grove, and R. F. Schneider, Abstract 358, p. 454, The Electrochemical Society Meeting Abstracts, Vol. 97-1, Montreal, Quebec, Canada, May 4-9, 1997.