LSI Surface Leveling by RF Sputter Etching-Reference-Cited by-同舟云学术

LSI Surface Leveling by RF Sputter Etching

Published:1979-09-01 Issue:9 Volume:126 Page:1531-1533
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Hom‐ma Yoshio¹²,Harada Seiki¹²,Kaji Tadao¹²

Affiliation:

1. Hitachi, Limited, Central Research Laboratory, Kokubunji, Tokyo, 185, Japan

2. Hitachi, Ltd., Device Development Center, Kodaira, Tokyo, 187, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2129322/pdf

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