The Effects of Processing Parameters in the Chemical Vapor Deposition of Cobalt from Cobalt Tricarbonyl Nitrosyl-Reference-Cited by-同舟云学术

The Effects of Processing Parameters in the Chemical Vapor Deposition of Cobalt from Cobalt Tricarbonyl Nitrosyl

Published:1999-06-01 Issue:6 Volume:146 Page:2139-2145
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Ivanova Ana R.¹,Nuesca Guillermo¹,Chen Xiaomeng¹,Goldberg Cindy¹,Kaloyeros Alain E.¹²³,Arkles Barry²,Sullivan John J.³

Affiliation:

1. New York State Center for Advanced Thin Film Technology and Department of Physics, The State University of New York at Albany, Albany, New York 12222, United States of America

2. Gelest Incorporated, Tullytown, Pennsylvania 19007, United States of America

3. MKS Instruments, Andover, Massachusetts 01810, United States of America

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391904/pdf

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