A Study on Low Dielectric Material Deposition Using a Helicon Plasma Source-Reference-Cited by-同舟云学术

A Study on Low Dielectric Material Deposition Using a Helicon Plasma Source

Published:1996-09-01 Issue:9 Volume:143 Page:2990-2995
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Kim Jung‐Hyung¹²³,Seo Sang‐Hun¹²³,Yun Seok‐Min¹²³,Chang Hong‐Young¹²³,Lee Kwang‐Man²,Choi Chi‐Kyu³

Affiliation:

1. Plasma Physics Laboratory, Department of Physics, Korea Advanced Institute of Science and Technology, Taejon 305‐701, Korea

2. Department of Electrical Engineering, Cheju National University, Cheju 690‐756, Korea

3. Department of Physics, Cheju National University, Cheju 690‐756, Korea

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837137/pdf

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