1. Cheng K. Park C. Yeung C. Nguyen S. Zhang J. Miao X. Wang M. Mehta S. Li J. Surisetty C. Muthinti R. Liu Z. Tang H. Tsai S. Yamashita T. Bu H. Divakaruni R. , International Electron Device Meeting Proceeding, Vol. 2016, paper 17.1, pp. 444. 2016, San Francisco, USA.
2. Penny C. Gates S. Peethala B. Lee J. Priyadarshini D. Nguyen Son V. McLaughlin P. Liniger E. Hu C.-K. Clevenger L. Hook T. Shobha H. Kerber P. Seshadri I. Chen J. Edelstein D. Quon R. Bonilla G. Paruchuri V. Huang E. , International Interconnect Technology Conference, Proceed. Volume, paper 2.2, May 16–18, 2017, Taipei, Taiwan; and references their in.
3. Nitta S. Ponoth S. Breyetta G. Colburn M. Clevenger L. Horak D. , Advanced Metallization Conference 2007, MRS Proceeding Volume, pp 329.
4. Chen Hsien-Wei , Proceedings of the 11th IITC, pp. 34, Burlingame, CA, June 1–4, (2008).
5. Adapting Interconnect Technology to Multigate Transistors for Optimum Performance