Mechanism of Modification of Fluorocarbon Polymer by Ultraviolet Irradiation in Oxygen Atmosphere-Reference-Cited by-同舟云学术

Mechanism of Modification of Fluorocarbon Polymer by Ultraviolet Irradiation in Oxygen Atmosphere

Published:2013 Issue:5 Volume:2 Page:N93-N98
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Toan Le Quoc,Naumov Sergej,Conard Thierry,Franquet Alexis,Müller Matthias,Beckhoff Burkhard,Adelmann Christoph,Struyf Herbert,De Gendt Stefan,Baklanov Mikhail R.

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Patterning of narrow porous SiOCH trenches using a TiN hard mask

2. Effect of UV Irradiation on Modification and Subsequent Wet Removal of Model and Post-Etch Fluorocarbon Residues

3. Etching of porous SiOCH materials in fluorocarbon-based plasmas

4. Roughening of porous SiCOH materials in fluorocarbon plasmas

5. Alternative Photoresist Removal Process to Minimize Damage of Low-kMaterial Induced by Ash Plasma

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