Assessment of the Progress in Gas-Phase Processing of Silicon Surfaces-Reference-Cited by-同舟云学术

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Assessment of the Progress in Gas-Phase Processing of Silicon Surfaces

Published:2013-12-31 Issue:1 Volume:3 Page:N3060-N3063
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Ruzyllo Jerzy

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Ruzyllo J. , in Handbook of Semiconductor Wafer Cleaning Technology, Kern W. , Ed., Noyes Publ., 1993.

2. Ultraclean Surface Processing of Silicon Wafers

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gas-Phase Wafer Cleaning Technology;Handbook of Silicon Wafer Cleaning Technology;2018

2. Effects of surface nanostructures on self-cleaning and anti-fogging characteristics of transparent glass;Journal of Mechanical Science and Technology;2017-11

3. Front-End Processes;Nanoelectronics;2017-04-07

4. Gas-Phase Cleaning for Removal of Surface Contaminants;Developments in Surface Contamination and Cleaning, Volume 9;2017

5. Nonaqueous Cleaning Challenges for Preventing Damage to Fragile Nanostructures;Developments in Surface Contamination and Cleaning, Volume 9;2017

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