1. R. J. Hillard, R. G. Mazur, G. A. Gruber, and J. C. Sherbondy, in
Diagnostic Techniques for Semiconductor Materials and Devices
, P. Rai-Choudhury, J. L. Benton, D. K. Schroder, and T. J. Shaffner, PV 97-12, p. 310, The Electrochemical Society Proceedings Series, Pennington, NJ (1997).
2. E. H. Nicollian and J. R. Brews,
MOS Physics and Technology
, John Wiley & Sons, New York (1982).
3. MOS capacitance measurements for high-leakage thin dielectrics