In Situ Characterization of Anodic Silicon Oxide Films by AC Impedance Measurements
Author:
Affiliation:
1. Institute of Materials Chemistry and Corrosion, Swiss Federal Institute of Technology, ETH‐Hönggerberg, CH‐8093 Zürich, Switzerland
2. Institute for Microstructural Sciences, National Research Council of Canada, Ottawa, Ontario, Canada K1A 0R6
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.2048644/pdf
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