Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate-Reference-Cited by-同舟云学术

Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate

Published:1989-11-01 Issue:11 Volume:136 Page:3525-3529
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Temple D.¹²,Reisman A.¹²

Affiliation:

1. Microelectronics Center of North Carolina, Research Triangle Park, North Carolina 27709

2. Microelectronics Center of North Carolina, Research Triangle Park, North Carolina 27709 and Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695‐7911

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2096498/pdf

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