1. A Contactless Alternative to MOS Charge Measurements by Means of a Corona-Oxide-Semiconductor (COS) Technique;Verkuil;Electrochemical Society Meeting,1988
2. Contact Potential Difference Methods for Full Wafer Characterization of Oxidized Silicon;Lagowski;Institute of Physics Conference Series,1998
3. Schroder in D. K. , Semiconductor materials and Device Characterization, 3rd ed., Chapter 9, pp. 523, Wiley-Interscience, Hoboken, New Jersey (2006).
4. Corona-Kelvin is presently the most common name, however the technique was also termed COS (corona oxide semiconductor), COCOS (corona oxide characterization of semiconductors) or V-Q (voltage-charge).
5. “Quantox” initially by Keithley Instruments, Inc., later on by KLA-Tencor; “FAaST” series tools by Semiconductor Diagnostics, Inc. presently Semilab SDI LLC in Tampa, FL and WT series tools from Semilab Budapest, Hungary.