Role of 1,2-benzisothiazolin-3-one (BIT) in the Improvement of Barrier CMP Performance with Alkaline Slurry
Author:
Funder
Hebei Natural Science Foudation Project
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
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1. Investigation of cu-BTA complex formation during Cu chemical mechanical planarization process
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4. Chemical mechanical planarization of barrier layers by using a weakly alkaline slurry
5. Galvanic Corrosion Inhibitors for Cu/Ru Couple during Chemical Mechanical Polishing of Ru
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