Processing and Characterization of Fluorinated Amorphous Carbon Low-Dielectric-Constant Films-Reference-Cited by-同舟云学术

Processing and Characterization of Fluorinated Amorphous Carbon Low-Dielectric-Constant Films

Published:2004 Issue:11 Volume:151 Page:F276
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Chen Hung-Jen,Chang Shou-Yi,Chiue Hua-Chun,Lai Wei-Shun,Lin Su-Jien

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Damascene copper electroplating for chip interconnections

2. Low dielectric constant materials and methods for interlayer dielectric films in ultralarge-scale integrated circuit multilevel interconnections

3. Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

4. Effect of fluorine on moisture absorption and dielectric properties of SiOF films

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