Selective Area Chemical Vapor Deposition of Silicon by the Alternating Cyclic Method: A Thermodynamic Analysis-Reference-Cited by-同舟云学术

Selective Area Chemical Vapor Deposition of Silicon by the Alternating Cyclic Method: A Thermodynamic Analysis

Published:1994-02-01 Issue:2 Volume:141 Page:593-602
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Wang Q. S.¹²³,Reisman A.¹²³,Temple D.¹²³

Affiliation:

1. Department of Physics, Box 8202, North Carolina State University, Raleigh, North Carolina 27695‐8202

2. Department of Electrical and Computer Engineering, Box 7911, North Carolina State University, Raleigh, North Carolina 27695‐7911

3. Electronic Technologies Division, MCNC, P. O. Box 12889, Research Triangle Park, North Carolina 27709‐2889

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2054774/pdf

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