A Modified Scheme to Reduce the Specific Contact Resistivity of NiSi/Si Contacts by Means of Dopant Segregation Technique

Author:

Duan Ningyuan,Wang Guilei,Luo Jun,Mao Shujuan,Luo Xue,Xu Jing,Wang Wenwu,Liu Shi,Chen Dapeng,Li Junfeng,Zhao Chao,Ye Tianchun

Funder

national ST major project 02

national high technology research and development program 863

opening projects of microelectronic device integrated technology, institute of microelectronics, chinese academy of science

Youth Innovation Promotion Association of CAS

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference42 articles.

1. Titanium Silicide on Si:P With Precontact Amorphization Implantation Treatment: Contact Resistivity Approaching $1 \times 10^{-9}$ Ohm-cm2

2. Yu H. Schaekers M. Hikavyy A. , VLSI Technology, Symposium on IEEE, (2016).

3. Yu H. Schaekers M. Demuynck S. , Interconnect Technology Conference/Advanced Metallization Conference (IITC/AMC), International, IEEE, 66 (2016).

4. Yang Y. Breil N. Yang C. , VLSI Technology, Symposium on IEEE (2016).

5. Ni C.-N. Rao K. V. Khaja F. , VLSI Technology, Symposium on IEEE (2016).

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1. Low-Temperature Recrystallization and Contact Process Technology for 3D Sequential Integration;2022 IEEE 16th International Conference on Solid-State & Integrated Circuit Technology (ICSICT);2022-10-25

2. Low contact resistivity of Ti/TiN/Al for NiSi2 on epitaxial Si:P structure at full low-temperature process below 450 °C;Semiconductor Science and Technology;2021-07-22

3. Effects of Ni Film Thickness on the Properties of Ni-Based Silicides Formed on Both Highly Doped n- and p-Si Substrate;ECS Journal of Solid State Science and Technology;2020-02-19

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