Optimization of Interlevel Dielectrics for Embedded Nonvolatile Deep Submicrometer Technologies-Reference-Cited by-同舟云学术

Optimization of Interlevel Dielectrics for Embedded Nonvolatile Deep Submicrometer Technologies

Published:2005 Issue:5 Volume:152 Page:G398
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Cacciato A.,Dormans D.,Scarpa A.,Habaš P.,de Keijser M.,van de Ven G.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference20 articles.

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5. Gate oxide damage: Testing approaches and methodologies

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