Effect of Sr(OH)2 as a pH Regulator on Different Plane Sapphire Substrate Chemical Mechanical Polishing
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference33 articles.
1. Removal mechanism of sapphire substrates (0001, 112¯0 and 101¯0) in mechanical planarization machining
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3. Influence of Nano Abrasive on Chemical Mechanical Ultra-Precision Machining of Sapphire Substrate Surfaces
4. Preparation of non-spherical silica composite abrasives by lanthanum ion-induced effect and its chemical–mechanical polishing properties on sapphire substrates
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