Non-Contact and Non-Destructive Characterization Alternatives of Ultra-Shallow Implanted Silicon p-n Junctions by Multi-Wavelength Raman and Photoluminescence Spectroscopy

Author:

Yoo Woo Sik,Ueda Takeshi,Ishigaki Toshikazu,Kang Kitaek,Fukumoto Masashi,Hasuike Noriyuki,Harima Hiroshi,Yoshimoto Masahiro

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

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3. Novel Methods For Ultrashallow Low Resistance Junction Formation

4. Crystal Damage Removal by Spike and Flash Annealing

5. Millisecond Annealing Junctions for Near-Scaling-Limit Bulk CMOS Using Raised Source/Drain Extensions

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