A Multiscale Simulator for Low Pressure Chemical Vapor Deposition-Reference-Cited by-同舟云学术

A Multiscale Simulator for Low Pressure Chemical Vapor Deposition

Published:1997-11-01 Issue:11 Volume:144 Page:3945-3951
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Gobbert Matthias K.¹²³,Merchant Tushar P.¹²³,Borucki Leonard J.¹²³,Cale Timothy S.¹²³

Affiliation:

1. Institute for Mathematics and Its Applications, University of Minnesota, Minneapolis, Minnesota 55455‐0436

2. Advanced Custom Technologies, Motorola Incorporated, Mesa, Arizona 85202

3. Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287‐6206

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838116/pdf

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