Chemical Structure Effects of Ring-Type Siloxane Precursors on Properties of Plasma-Polymerized Porous SiOCH Films-Reference-Cited by-同舟云学术

Chemical Structure Effects of Ring-Type Siloxane Precursors on Properties of Plasma-Polymerized Porous SiOCH Films

Published:2007 Issue:7 Volume:154 Page:D354
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Tada Munehiro,Yamamoto Hironori,Ito Fuminori,Takeuchi Tsuneo,Furutake Naoya,Hayashi Yoshihiro

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference21 articles.

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2. N. Oda, S. Ito, T. Takewaki, H. Kunishima, N. Hironaga, I. Honma, H. Namba, S. Yokogawa, T. Goto, T. Usami, K. Ohto, A. Kubo, H. Aoki, M. Suzuki, Y. Yamamoto, S. Watanabe, T. Takeda, K. Yamada, M. Kosaka, and T. Horiuchi , inIEEE VLSI Tech. Dig., IEEE, p. 34 (2002).

3. Robust porous SiOCH/Cu interconnects with ultrathin sidewall protection liners

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