Kinetic and Transport Modeling of the Metallorganic Chemical Vapor Deposition of InP from Trimethylindium and Phosphine and Comparison with Experiments-Reference-Cited by-同舟云学术

Kinetic and Transport Modeling of the Metallorganic Chemical Vapor Deposition of InP from Trimethylindium and Phosphine and Comparison with Experiments

Published:1995-06-01 Issue:6 Volume:142 Page:2086-2094
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Theodoropoulos C.¹,Ingle N. K.¹,Mountziaris T. J.¹,Chen Z. ‐Y.²,Liu P. L.²,Kioseoglou G.³,Petrou A.³

Affiliation:

1. Department of Chemical Engineering, Center for Electronic and Electro‐optic Materials, State University of New York, Buffalo, New York 14260

2. Department of Electrical and Computer Engineering, Center for Electronic and Electro‐optic Materials, State University of New York, Buffalo, New York 14260

3. Department of Physics, Center for Electronic and Electro‐optic Materials, State University of New York, Buffalo, New York 14260

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2044246/pdf

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