Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides-Reference-Cited by-同舟云学术

Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides

Published:2001 Issue:6 Volume:148 Page:F115
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Wu Zhen-Cheng,Shiung Zhi-Wen,Chiang Chiu-Chih,Wu Wei-Hao,Chen Mao-Chieh,Jeng Shwang-Ming,Chang Weng,Chou Pei-Fen,Jang Syun-Ming,Yu Chen-Hua,Liang Mong-Song

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. M. Matsuura, Y. Hayashide, H. Kotani, T. Nishimura, H. Iuchi, C. D. Dobson, A. Kiermasz, K. Beekmann, and R. Wilby, inProceedings of 1994 IEEE IEDM, p. 117, Dec 11-14, 1994.

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