Plane‐Wave X‐Ray Topography Using Imaging Plates and Its Application to Characterization of Lattice Distortion in As‐Grown Silicon-Reference-Cited by-同舟云学术

Plane‐Wave X‐Ray Topography Using Imaging Plates and Its Application to Characterization of Lattice Distortion in As‐Grown Silicon

Published:1997-11-01 Issue:11 Volume:144 Page:4035-4041
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Kudo Y.¹²,Liu K.‐Y.¹²,Kojima S.¹²,Kawado S.¹²,Ishikawa T.¹²

Affiliation:

1. Sony Corporation, Research Center, 174 Fujitsuka‐cho, Hodogaya‐ku, Yokohama 240, Japan

2. Faculty of Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838131/pdf

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