Plane‐Wave X‐Ray Topography Using Imaging Plates and Its Application to Characterization of Lattice Distortion in As‐Grown Silicon
Author:
Affiliation:
1. Sony Corporation, Research Center, 174 Fujitsuka‐cho, Hodogaya‐ku, Yokohama 240, Japan
2. Faculty of Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1838131/pdf
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2. Plane-wave synchrotron x-ray topography observation of grown-in microdefects in a slowly pulled CZ-silicon crystal;Journal of Physics D: Applied Physics;2005-05-06
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